Horizontal Handle Breeze – H2BST-12

The Breeze wand is non-contact wafer handling wand that employees the Bernoulli principle to lift and hold the substrate securely without touching it. Four "corral" pins keep the substrate centered on the wand. Ideally suited for wafers with etched cavities or Taiko wafers. The horizontal Breeze is ideal for removing substrates from a platen or cassette from the top down unloading.


Wafer Size 12, 8, 6, 4, 3 inch